Seal configuration for a system for continuous deposition of a thin film layer on a substrate

ABSTRACT

An apparatus and associated method of operation is provided for vapor deposition of a sublimated source material, such as CdTe, as a thin film on discrete photovoltaic (PV) module substrates that are conveyed in a continuous, non-stop manner through the apparatus. The apparatus includes a deposition head configured for receipt and sublimation of the source material. The deposition head has a distribution plate at a defined distance above a horizontal conveyance plane of an upper surface of the substrates conveyed through a deposition area within the apparatus. The sublimated source material moves through the distribution plate and deposits onto the upper surface of the substrates as they are conveyed through the deposition area. The substrates move into and out of the deposition area through entry and exit slots that are defined by transversely extending entrance and exit seals. The seals are disposed at a gap distance above the upper surface of the substrates that is less than the distance or spacing between the upper surface of the substrates and the distribution plate. The seals have a ratio of longitudinal length (in the direction of conveyance of the substrates) to gap distance of from about 10:1 to about 100:1.

FIELD OF THE INVENTION

The subject matter disclosed herein relates generally to the field ofthin film deposition systems wherein a thin film layer, such as asemiconductor material layer, is deposited on a substrate. Moreparticularly, the disclosed subject matter is related to a system fordepositing a thin film layer of a photo-reactive material on a glasssubstrate in the formation of photovoltaic (PV) modules.

BACKGROUND OF THE INVENTION

Thin film photovoltaic (PV) modules (also referred to as “solar panels”or “solar modules”) based on cadmium telluride (CdTe) paired withcadmium sulfide (CdS) as the photo-reactive components are gaining wideacceptance and interest in the industry. CdTe is a semiconductormaterial having characteristics particularly suited for conversion ofsolar energy (sunlight) to electricity. For example, CdTe has an energybandgap of 1.45 eV, which enables it to convert more energy from thesolar spectrum as compared to lower bandgap (1.1 eV) semiconductormaterials historically used in solar cell applications. Also, CdTeconverts energy more efficiently in lower or diffuse light conditions ascompared to the lower bandgap materials and, thus, has a longereffective conversion time over the course of a day or in low-light(e.g., cloudy) conditions as compared to other conventional materials.

Solar energy systems using CdTe PV modules are generally recognized asthe most cost efficient of the commercially available systems in termsof cost per watt of power generated. However, the advantages of CdTe notwithstanding, sustainable commercial exploitation and acceptance ofsolar power as a supplemental or primary source of industrial orresidential power depends on the ability to produce efficient PV moduleson a large scale and in a cost effective manner.

Vapor deposition systems for processing individual glass sheets in theformation of PV modules are known. For all such systems, a vacuum lockor seal configuration must be provided at the ingress and egress pointsfor the glass substrate as it moves into and out of the depositionchamber. For example, it is known to use vacuum locks (also referred toas “load locks”) for indexing discrete glass sheets into and out of adeposition chamber, as described in U.S. Pat. No. 4,797,054. Thesevacuum locks essentially seal the glass sheet within the chamber duringthe static deposition process and are not suitable for continuousconveyance of discrete glass sheets through a deposition chamber.

U.S. Pat. No. 5,772,715 describes a deposition system wherein multiplevacuum chamber slit seals are provided at the ingress and egresslocations. These seals are relatively complicated and involveestablishing three separate vacuum stages drawn by separate vacuumpumps. Although the U.S. '715 patent describes that the seals aresuitable for processing either discrete glass sheets or a continuousglass ribbon, they are mechanically quite complex and would addsignificantly to the manufacturing costs of PV modules.

CSS (Close Space Sublimation) is a known commercial vapor depositionprocess for production of CdTe modules. Reference is made, for example,to U.S. Pat. No. 6,444,043 and U.S. Pat. No. 6,423,565. While there areadvantages to the CSS process, the system is inherently a batch processwherein the glass substrates are indexed into a vapor depositionchamber, held in the chamber for a finite period of time in which thefilm layer is formed, and subsequently indexed out of the chamber. TheU.S. '565 patent cited above describes a system whereinair-to-vacuum-to-air (AVA) openings are provided for indexing the glasssubstrates into and out of a vacuum chamber, which includes a processingstation for vapor deposition of a film on the glass substrates. Thepatent purports to provide a “novel sealing relationship” between thedeposition station (a heated “block” having a pocket in which the sourcematerial is contained) and the glass substrate wherein a relativelytight tolerance is maintained between the glass and the top of the blockon the order of 0.001 in. to 0.018 in. This configuration results in theglass substrate essentially acting as a shutter across the top of theblock pocket. This shutter-type of seal configuration wherein the glasssubstrate essentially seals the deposition chamber is not suitable for acontinuous deposition process wherein discrete glass sheets arecontinuously conveyed through a vacuum deposition chamber.

Accordingly, there exists an ongoing need in the industry for a sealconfiguration that is particularly suited for large scale and efficientproduction of PV modules, particularly CdTe based modules, by continuousconveyance of a plurality of discrete substrates through a vapordeposition chamber.

BRIEF DESCRIPTION OF THE INVENTION

Aspects and advantages of the invention will be set forth in part in thefollowing description, or may be obvious from the description, or may belearned through practice of the invention.

In accordance with an embodiment of the invention, an apparatus isprovided for vapor deposition of a sublimated source material, such asCdTe, as a thin film on discrete photovoltaic (PV) module substratesthat are conveyed in a continuous, non-stop manner through theapparatus. The apparatus includes a deposition head configured forreceipt and sublimation of the source material. The deposition head hasa distribution plate at a defined distance above a horizontal conveyanceplane of an upper surface of the substrates conveyed through adeposition area within the apparatus. The sublimated source materialmoves through the distribution plate and deposits onto the upper surfaceof the substrates as they are conveyed through the deposition area. Thesubstrates move into and out of the deposition area through entry andexit slots that are defined by transversely extending entrance and exitseals. At least one of these seals is disposed at a gap distance abovethe upper surface of the substrates that is less than the distance orspacing between the upper surface of the substrates and the distributionplate. The seal has a ratio of longitudinal length (in the direction ofconveyance of the substrates) to gap distance of from about 10:1 toabout 100:1. This unique seal configuration ensures that the sublimatedsource material is contained within the deposition area yet does notinhibit the continuous movement of substrates into and out of thedeposition area. Both the entry and exit seals may have thisconfiguration.

In a unique embodiment, the gap distance between the upper surface ofthe substrates and the seals is between about 1/16 or about 0.06 of aninch (about 1.59 mm.) to about 3/16 or about 0.18 of an inch (about 4.76mm.).

In particular embodiments, the seals may have a flat, continuous surfaceover the longitudinal length thereof and may be defined, for example, bystructure of the deposition head at opposite longitudinal ends of thedeposition area. This structure may be heated to a temperature greaterthan that of the substrates conveyed through the deposition area.

Variations and modifications to the apparatus discussed above are withinthe scope and spirit of the invention and may be further describedherein.

In accordance with another embodiment of the present invention, aprocess is provided for vapor deposition of a thin film layer, such as aCdTe film layer, on photovoltaic (PV) module substrates. The processincludes supplying source material to a deposition head and heating thesource material to sublimate the source material. A plurality of the PVmodule substrates are conveyed in a continuous, non-stop manner belowthe deposition head. The sublimated source material moves downwardlywithin the deposition head and deposits on the upper surface of thesubstrates in a deposition area. The substrates are moved throughentrance and exit slots at opposite longitudinal ends of the depositionarea, with the entrance and exit slots defined by transversely extendingentrance and exit seals disposed at a gap distance above the uppersurface of the substrates and having a ratio of longitudinal length (indirection of conveyance of the substrates) to gap distance of from about10:1 to about 100:1.

In a particular embodiment of the process, the source material is heatedwithin the deposition head with a heat source member and the sublimatedsource material passes through the heat source member before depositingonto the upper surface of the substrates. The substrates may be conveyedat a controlled constant linear speed such that leading and trailingsections of each substrate in a conveyance direction are exposed to thesame vapor deposition conditions within the deposition head to achieve asubstantially uniform thickness of the thin film layer on the uppersurface of the substrates.

Variations and modifications to the embodiments of the process discussedabove are within the scope and spirit of the invention and may befurther described herein.

These and other features, aspects and advantages of the presentinvention will become better understood with reference to the followingdescription and appended claims.

BRIEF DESCRIPTION OF THE DRAWING

A full and enabling disclosure of the present invention, including thebest mode thereof, is set forth in the specification, which makesreference to the appended drawings, in which:

FIG. 1 is a plan view of an embodiment of a system incorporating a vapordeposition apparatus in accordance with aspects of the invention;

FIG. 2 is a cut-away side view of an embodiment of a vapor deposition inaccordance with aspects of the invention;

FIG. 3 is a diagrammatic side view of an embodiment of a sealconfiguration that may be used in the embodiment of FIG. 2;

FIG. 4 is a perspective view of components of an alternate embodiment ofa vapor deposition apparatus in accordance with aspects of theinvention;

FIG. 5 is a diagrammatic side view of an embodiment of a sealconfiguration that may be used in the embodiment of FIG. 4; and,

FIG. 6 is partial perspective view of an embodiment of a conveyor thatmay be used in a vapor deposition apparatus in accordance with aspectsof the invention.

DETAILED DESCRIPTION OF THE INVENTION

Reference now will be made in detail to embodiments of the invention,one or more examples of which are illustrated in the drawings. Eachexample is provided by way of explanation of the invention, notlimitation of the invention. In fact, it will be apparent to thoseskilled in the art that various modifications and variations can be madein the present invention without departing from the scope or spirit ofthe invention. For instance, features illustrated or described as partof one embodiment, can be used with another embodiment to yield a stillfurther embodiment. Thus, it is intended that the present inventionencompass such modifications and variations as come within the scope ofthe appended claims and their equivalents.

FIG. 1 illustrates an embodiment of a vapor deposition system 10 thatmay incorporate an apparatus in accordance with aspects of theinvention. The system 10 is configured for deposition of a thin filmlayer on a photovoltaic (PV) module substrate 14 (referred to hereafteras “substrate”). The thin film may be, for example, a film layer ofcadmium telluride (CdTe). Although the invention is not limited to anyparticular film thickness, as mentioned, it is generally recognized inthe art that a “thin” film layer on a PV module substrate is generallyless than about 10 microns (μm). It should be appreciated that thepresent apparatus and process are not limited to use in the system 10illustrated in FIG. 1, but may be incorporated into any suitableprocessing line configured for vapor deposition of a thin film layeronto a PV module substrate 14.

For reference and an understanding of an environment in which thepresent apparatus may be used, the system 10 of FIG. 1 is describedbelow, followed by a detailed description of the unique features of thepresent apparatus.

Referring to FIG. 1, the exemplary system 10 includes a vacuum chamber12 defined by a plurality of interconnected modules. Any combination ofinitial (“rough”) and high (“fine”) vacuum pumps 40 may be configuredwith the modules to draw and maintain a vacuum within the chamber 12. Aplurality of interconnected heater modules 16 define a pre-heat sectionof the vacuum chamber 12 through which the substrates 14 are conveyedand heated to a desired temperature before being conveyed into a vapordeposition apparatus 60. Each of the modules 16 may include a pluralityof independently controlled heaters 18, with the heaters defining aplurality of different heat zones. A particular heat zone may includemore than one heater 18.

The vacuum chamber 12 also includes a plurality of interconnectedcool-down modules 20 within the vacuum chamber 12 downstream of thevapor deposition apparatus 60. The cool-down modules 20 define acool-down section within the vacuum chamber 12 in which the substrates14 having the thin film of sublimed source material deposited thereonare allowed to cool at a controlled cool-down rate prior to thesubstrates 14 being removed from the system 10. Each of the modules 20may include a forced cooling system wherein a cooling medium, such aschilled water, refrigerant, or other medium is pumped through coolingcoils configured with the modules 20.

In the illustrated embodiment of system 10, at least one post-heatmodule 22 is located immediately downstream of the vapor depositionapparatus 60 and before the cool-down modules 20. The post-heat module22 maintains a controlled heating profile of the substrate 14 until theentire substrate is moved out of the vapor deposition apparatus 60 toprevent damage to the substrate, such as warping or breaking caused byuncontrolled or drastic thermal stresses. If the leading section of thesubstrate 14 were allowed to cool at an excessive rate as it exited theapparatus 60, a potentially damaging temperature gradient would begenerated longitudinally along the substrate 14. This condition couldresult in breaking, cracking, or warping of the substrate from thermalstress.

As diagrammatically illustrated in FIG. 1, a feed device 24 isconfigured with the vapor deposition apparatus 60 to supply sourcematerial, such as granular CdTe. Preferably, the feed device 24 isconfigured so as to supply the source material without interrupting thecontinuous vapor deposition process within the apparatus 60 orconveyance of the substrates 14 through the apparatus 60.

Still referring to FIG. 1, the individual substrates 14 are initiallyplaced onto a load conveyor 26, and are subsequently moved into an entryvacuum lock station that includes a load module 28 and a buffer module30. A “rough” (i.e., initial) vacuum pump 32 is configured with the loadmodule 28 to drawn an initial vacuum, and a “fine” (i.e., high) vacuumpump 38 is configured with the buffer module 30 to increase the vacuumin the buffer module 30 to essentially the vacuum within the vacuumchamber 12. Valves 34 (e.g., gate-type slit valves or rotary-typeflapper valves) are operably disposed between the load conveyor 26 andthe load module 28, between the load module 28 and the buffer module 30,and between the buffer module 30 and the vacuum chamber 12. These valves34 are sequentially actuated by a motor or other type of actuatingmechanism 36 in order to introduce the substrates 14 into the vacuumchamber 12 in a step-wise manner without affecting the vacuum within thechamber 12.

An exit vacuum lock station is configured downstream of the lastcool-down module 20, and operates essentially in reverse of the entryvacuum lock station described above. For example, the exit vacuum lockstation may include an exit buffer module 42 and a downstream exit lockmodule 44. Sequentially operated slide valves 34 are disposed betweenthe buffer module 42 and the last one of the cool-down modules 20,between the buffer module 42 and the exit lock module 44, and betweenthe exit lock module 44 and an exit conveyor 46. A fine vacuum pump 38is configured with the exit buffer module 42, and a rough vacuum pump 32is configured with the exit lock module 44. The pumps 32, 38 and valves34 are sequentially operated to move the substrates 14 out of the vacuumchamber 12 in a step-wise fashion without loss of vacuum conditionwithin the vacuum chamber 12.

The system 10 also includes a conveyor system configured to move thesubstrates 14 into, through, and out of the vacuum chamber 12. In theillustrated embodiment, this conveyor system includes a plurality ofindividually controlled conveyors 48, with each of the various modulesincluding one of the conveyors 48. It should be appreciated that thetype or configuration of the conveyors 48 in the various modules mayvary. In the illustrated embodiment, the conveyors 48 are rollerconveyors having driven rollers that are controlled so as to achieve adesired conveyance rate of the substrates 14 through the respectivemodule and the system 10 overall. The conveyor in the vapor depositionapparatus 60 may have a different configuration, as discussed in greaterdetail below.

As described, each of the various modules and respective conveyors inthe system 10 are independently controlled to perform a particularfunction. For such control, each of the individual modules may have anassociated independent controller 50 configured therewith to control theindividual functions of the respective module. The plurality ofcontrollers 50 may, in turn, be in communication with a central systemcontroller 52, as illustrated in FIG. 1. The central system controller52 can monitor and control (via the independent controllers 50) thefunctions of any one of the modules so as to achieve an overall desiredheat-up rate, deposition rate, cool-down rate, and so forth, inprocessing of the substrates 14 through the system 10.

Referring to FIG. 1, for independent control of the individualrespective conveyors 48, each of the modules may include any manner ofactive or passive sensor 54 that detects the presence of the substrates14 as they are conveyed through the module. The sensors 54 are incommunication with the respective module controller 50, which is in turnin communication with the central controller 52. In this manner, theindividual respective conveyor 48 may be controlled to ensure that aproper spacing between the substrates 14 is maintained and that thesubstrates 14 are conveyed at the desired constant conveyance ratethrough the vacuum chamber 12.

An exemplary vapor deposition apparatus 60 is depicted in FIG. 1 as amodule. This module may take on various configurations and operatingprinciples within the scope and spirit of the invention, and isgenerally configured for vapor deposition of a sublimated sourcematerial, such as CdTe, as a thin film on the PV module substrates 14.In the embodiment of the system 10 illustrated in FIG. 1, the apparatus60 is a module that includes a casing 95 (FIG. 2) in which the internalcomponents are contained, including a deposition head 62 mounted above aconveyor assembly 100. It should be appreciated that the casing 95 mayinclude any manner of internal structure 97 that may support theconveyor assembly 100.

Various embodiments of a conveyor assembly 100 may be utilized. In FIG.2, the conveyor assembly 100 may be modular in construction and includea housing 104, as depicted in FIG. 4. The housing 104 has been removedin the view of FIG. 2 for sake of clarity and explanation. Components ofthe conveyor assembly 100 are discussed below.

Referring to FIG. 2, the module 60 is depicted in greater detail. Thevacuum deposition head 62 defines an interior space in which areceptacle 66 is configured for receipt of a granular source material(not shown). As mentioned, the granular source material may be suppliedby a feed device or system 24 (FIG. 1) via a feed tube 70. The feed tube70 is connected to a distributor 72 disposed in an opening in a top wallof the deposition head 62. The distributor 72 includes a plurality ofdischarge ports that are configured to evenly distribute the granularsource material into the receptacle 66. A thermocouple 74 isoperationally disposed through the top wall of the deposition head 62 tomonitor temperature within the head chamber adjacent or in thereceptacle 66.

The feed system 24 is designed to continuously supply the apparatus 60with source material in a manner so as not to interrupt the vapordeposition process or non-stop conveyance of the substrates 14 throughthe module 60. The feed system 24 is not a limiting factor of theinvention, and any suitable feed system may be devised to supply thesource material into the apparatus 60. For example, the feed system 24may include sequentially operated vacuum locks wherein an externalsource of the material is introduced as metered doses in a step-wisemanner through the vacuum locks and into the receptacle 66 within thevapor deposition apparatus 60. The supply of source material isconsidered “continuous” in that the vapor deposition process need not bestopped or halted in order to re-supply the apparatus 60 with sourcematerial. So long as the external supply is maintained, the feed system24 will continuously supply batches or metered doses of the materialinto the vapor deposition apparatus 60.

The receptacle 66 has a shape and configuration such that end walls 68of the receptacle 66 are spaced from end walls 76 of the deposition head62. The side ails of the receptacle 66 lie adjacent to and in closeproximity to the side walls of the deposition head 62 (not visible inthe view of FIG. 2) so that very little clearance exists between therespective side walls. With this configuration, sublimated sourcematerial will flow out of the receptacle 66 as leading and trailingcurtains of vapor 67 over the transversely extending end walls 68, asindicated by the flow arrows in FIG. 2. Very little of the sublimatedsource material will flow over the side walls of the receptacle 66.

A heated distribution manifold 78 is disposed below the receptacle 66,and may have a clam-shell configuration that includes an upper shellmember 80 and a lower shell member 82. The mated shell members 80, 82define cavities in which heater elements 84 are disposed. The heaterelements 84 heat the distribution manifold 78 to a degree sufficient forindirectly heating the source material within the receptacle 66 to causesublimation of the source material. The heat generated by thedistribution manifold 78 also aids in preventing the sublimated sourcematerial from plating out onto components of the deposition head 62.Additional heater elements 98 may also be disposed within the depositionhead 62 for this purpose. Desirably, the coolest component within thedeposition head 62 is the upper surface of the substrates 14 conveyedtherethrough so that the sublimated source material is ensured to plateprimarily on the substrates.

The embodiment of FIG. 2 includes a movable shutter plate 90 disposedabove the distribution manifold 78. This shutter plate 90 includes aplurality of passages 94 defined therethrough that align with thepassages 86 in the distribution manifold 78 in a first operationalposition of the shutter plate 90 (not depicted in FIG. 2) such that thesublimated source material is free to flow through the shutter plate 90and through the distribution manifold 78 for subsequent distributionthrough the plate 88. The shutter plate 90 is movable to a secondoperational position (depicted in FIG. 2) wherein the passages 94 aremisaligned with the passages 86 in the distribution manifold 78. In thisconfiguration, the sublimated source material is blocked from passingthrough the distribution manifold 78, and is essentially containedwithin the interior volume of the deposition head 62. Any suitableactuation mechanism 92 may be configured for moving the shutter plate 90between the first and second operational positions. In the illustratedembodiment, the actuation mechanism 92 includes a rod 93 and any mannerof suitable linkage that connects the rod 93 to the shutter plate 90.The rod 93 is externally rotated by any manner of mechanism locatedexternally of the deposition head 62. The shutter plate 90 isparticularly beneficial in that the sublimated source material can bequickly and easily contained within the deposition head 62 and preventedfrom passing through to the deposition area above the substrates 14 orconveyor assembly 100. This may be desired, for example, during start upof the system 10 while the concentration of vapors within the depositionhead chamber builds to a sufficient degree to start the depositionprocess. Likewise, during shutdown of the system, it may be desired tomaintain the sublimated source material within the deposition head 62 toprevent the material from condensing (also referred to as plating) onthe conveyor or other components of the apparatus 60.

A distribution plate 88 is disposed below the manifold 78 at a defineddistance above a horizontal plane of the upper surface of an underlyingsubstrate 14, as depicted in FIG. 2. A deposition area 112 (FIGS. 3 and5) is thus defined by the space between the distribution plate 88 andthe substrates 14. The distribution plate 88 includes a pattern of holesor passages therethrough that further distribute the sublimated sourcematerial passing through the distribution manifold 78 throughout thedeposition area 112. The passages 86 in the distribution manifold 78 andthe holes in the distribution plate 88 ensure a relatively uniformdistribution of the sublimated source material in the transverse aspectof the vapor deposition apparatus 60. So long as the uniform transverseaspect of the vapor is maintained, a relatively uniform thin film layeris deposited onto the upper surface of the substrates 14.

As previously mentioned, a significant portion of the sublimated sourcematerial will flow out of the receptacle 66 as transversely extendingleading and trailing curtains of vapor. Although these curtains of vaporwill diffuse to some extent in the longitudinal direction (direction ofconveyance of the substrates) prior to passing through the distributionplate 88, it should be appreciated that it is unlikely that a uniformdistribution of the sublimated source material in the longitudinaldirection will be achieved. In other words, within the deposition area112, more of the sublimated source material will be distributed throughthe longitudinal end sections of the distribution plate 88 as comparedto the middle portion of the distribution plate.

The individual substrates 14 are conveyed through the vapor depositionmodule 60 at a controlled constant linear speed. In other words, thesubstrates 14 are not stopped or held within the module 60, but movecontinuously through the module at a controlled linear rate. Theconveyance rate of the substrates 14 may be in the range of for example,about 10 mm/sec to about 40 mm/sec. In a particular embodiment, thisrate may be, for example, about 20 mm/sec. In this manner, the leadingand trailing sections of the substrates 14 in the conveyance directionare exposed to the same vapor deposition conditions within the vapordeposition module 60. All regions of the top surface of the substrates14 are exposed to the same vapor conditions so as to achieve asubstantially uniform thickness of the thin film layer of sublimatedsource material on the upper surface of the substrates 14.

As illustrated in FIG. 2, it may be desired to include a debris shield89 between the receptacle 66 and the distribution manifold 78. Thisshield 89 may include relatively large holes defined therethrough (ascompared to the distribution plate 88) and serves to retain any granularor particulate source material from passing through and potentiallyinterfering with operation of the other components of the depositionhead 62. In another embodiment, the holes may be very small, or theshield may be a mesh screen, so as to prevent even very small granulesor particles of solid source material from passing through the shield.

The vapor deposition apparatus 60 includes an entrance slot 120 and anexit slot 122 at opposite longitudinal ends of the deposition area 112(FIG. 3). The slots 120, 122 may define the longitudinal boundaries ofthe deposition area 112, as in the embodiment of FIG. 2, or may bespaced from the boundaries of the deposition area 112, as discussed morefully below with respect to the embodiment of FIGS. 4 and 5. Although itis within the scope and spirit of the invention that only one of theslots 120, 122 be configured as described herein, it is preferable isboth slots are configured with the unique seal arrangement. In thisregard, the entrance and exit slots 120, 122 are defined by transverselyextending entrance and exit seal structures 96. In the embodiment ofFIGS. 2 and 3, the seal structures are defined by transversely extendingshelf or ridge portions of the lower shell member 82 of the heateddistribution manifold 78 members. It should be readily appreciated thatthe seal structures 96 may be defined by any suitable device orstructure, and that the seals are not limited to the structure depictedand described herein.

Referring to FIG. 3, the seal structures 96 have a longitudinal length115 (in the direction of conveyance of the substrates 114) and aredisposed at a gap distance 113 above the upper surface of the substrates14 (which lie in a conveyance plane 117). The seal structures 96 areconfigured so as to have a ratio of longitudinal length 115 to gapdistance 113 of from about 10:1 to about 100:1. The seals 96 help tomaintain the sublimated source material in the deposition area 112 abovethe substrates 14. The unique ratio of length 115 to gap distance 113prevents the sublimated source material from “leaking” out through thelongitudinal entrance and exit slots 120, 122 yet provides sufficientclearance to ensure free and unimpeded conveyance of the substrates 14through the slots.

In a unique embodiment, the gap distance 113 between the upper surfaceof the substrates 14 and the seals 96 is between about 1/16 or about0.06 of an inch (about 1.59 mm.) to about 3/16 or about 0.18 of an inch(about 4.76 mm.).

In particular embodiments, the seals 96 may have a flat, continuoussurface over the longitudinal length 115 thereof and may be defined, forexample, by structure of the deposition head 62 at opposite longitudinalends of the deposition area 112, as illustrated in FIGS. 2 and 3. Thisstructure 96 may be heated to a temperature greater than that of thesubstrates 14 conveyed through the deposition area 112 to ensure thatthe sublimated source material plates onto the substrates 14 and notonto the seal structures 96.

Referring to FIGS. 4 and 5, the housing 104 of the conveyor assembly 100defines an enclosed interior volume (at least around the sides and top)in which a conveyor 102 is contained. The conveyor 102 is driven in anendless loop within the housing 104 around sprockets 138, with thisendless loop having an upper leg that moves along a track 144 in aconveyance direction of the substrates 14 through the vapor depositionhead 62, and a lower leg that moves in an opposite return direction. Thehousing 104 includes a top member 110 that defines the deposition area112. This open deposition area 112 aligns with the vapor deposition head62, particularly the distribution plate 88, as seen in FIG. 5, such thatthe upper surface of the substrates 14 are exposed to the distributionplate 88 in the open deposition area 112.

The conveyor 102 includes a plurality of interconnected slats 130. Eachof the slats 130 has a respective flat planar outer surface 132 (FIG. 6)and transverse edges. Each of the slats 130 has a leading transverseedge profile 135 and a trailing transverse edge profile 136. In theillustrated embodiment, the trailing edge profile 136 is inclined orslanted with respect to vertical and the leading transverse edge profile135 has a chamfered or double-angled profile, as is particularly seen inFIG. 6. The leading edge profile 135 cooperates with the trailing edge136 of an adjacent slat 130 so as to define a tortuous non-vertical paththrough the adjacent slats 130 along the upper leg of the conveyor 102.This tortuous path inhibits sublimated source material from passingthrough the conveyor slats 130. Still referring to FIGS. 5 and 6, it canbe seen that the adjacent slats 130 along the upper leg of the conveyordefine a flat, planar surface whereby the outer surfaces 132 of theslats lie in a common horizontal plane and define an uninterrupted flatsupport surface for the substrates 14 conveyed through the apparatus 60.This flat support surface prevents bowing of the glass substrates 14. Inaddition, the flat conveyor surface, in combination with the transverseedge profiles of the slats 130 discussed above, prevent back sidecoating of the substrates 14 with sublimated source material.

In a particular embodiment, the conveyor slats 130 are interconnected bylink assemblies 140, as depicted in FIG. 6. These link assemblies 140may take on various configurations. The link assemblies 140 includeinner and outer link plates 146, 148. Rollers 142 are contained betweenthe plates 146, 148 by respective axles 150. The axles 150 serve tointerconnect adjacent inner and outer plates 146, 148 at the respectivelongitudinal ends thereof, and to also rotationally support the rollers142 between the plates. Each of the inner and outer plates 146, 148includes a tab 152 that extends through a slot in the slats 130. Thesetabs 152 have an undercut (seen in FIG. 5) such that after insertion ofthe tabs 152 through the slots, the plates 146, 148 are shifted relativeto the tabs slats 130 to ensure that the slats 130 cannot be pulled fromthe plates 146, 148.

Referring to FIG. 6, one end of the axles 150 has an enlarged head thatprevents the axles from being pulled through the plates 146, 148. Theopposite end of the axles 150 protrudes through the outer plates 148. Aclip 156 attaches to the end of the axles 150, and extends between twoaxles. Thus, the clip 156 has a longitudinal length that is essentiallythe same as one of the plates 146, 148, and does not inhibit travel ofthe link assemblies 140 around the sprockets 138.

Referring again to the housing construction 104 depicted in FIGS. 4 and5, it can be seen that the open deposition area 112 in the top wall 110has a transverse dimension (relative to the conveyance direction of thesubstrates 14) that is less than the transverse length of the underlyingslats 130. In essence, the open deposition area 112 defines a “pictureframe” around a completely flat, planar surface of the conveyor 102 inits upper leg of travel. The flat surface defined by the upper surfaces132 of the slats is “uninterrupted” in that at no location within theopen deposition area 112 can a vertical line be drawn through thesurface. As described above, even at the transverse edges 135,136 ofadjacent slats 130, the transverse edge profiles define a non-verticaltortuous path that inhibits sublimated source material from passingtherethrough.

Referring again to FIGS. 3 and 4, the housing 104 includes end walls 108and side walls 106. The end walls 108, side walls 106, and top wall 110are connected to each other by a tab and slot arrangement wherein tabs114 on one wall engage within slots 116 on another wall. Pins 118 engagethrough the tabs 114 to retain the components in a connected assembly,as particularly illustrated in FIG. 4. This embodiment is particularlyuseful in that mechanical fasteners, such as screws, bolts, and thelike, are not necessary to assemble the housing 104. The components ofthe housing 104 simply slide together and are pinned in positionrelative to each other. Assembly/disassembly of the housing 104 formaintenance or other procedures is a relatively easy process in thisregard.

The housing 104, and conveyor 102 contained therein are configured fordrop-in placement of the assembly 110 in the vapor deposition module 60.A plurality of braces 166 are attached to the side walls 106 and extendthrough slots in the top wall 110. These braces 166 define a pluralityof lifting points for raising and lowering the assembly 100 into thecasing 95 of the vapor deposition module 60. When maintenance isrequired, the entire conveyor assembly 100 is easily lifted from themodule 60, and a spare assembly 100 is readily dropped in to replace theremoved assembly 100. In this way, maintenance may be conducted on theremoved assembly 100 while the processing line is returned to service.This keeps the vapor deposition line running in parallel withmaintenance tasks. The conveyor assembly 100 sits on registration pointswithin the casing 95 so that the different conveyor assemblies 100 areeasily installed and removed.

Referring to FIGS. 4 and 5, the top wall 110 defines the entry slot 120and the exit slot 122 for the substrates 14 that are conveyed under thevapor deposition head 62. Referring to FIG. 5, the seal structure 96 atthese slots may be defined by the top wall 110, or other structuresattached to the top wall 110. For example, in the illustratedembodiment, plate members 124 may be configured with the top member 110for this purpose. These plate members 124 have a flat continuous surfacewith a longitudinal sealing length 115 and a gap distance 113 with theupper surface of the substrates 14. The plate members 124 may beadjustable relative to the top wall 110 (depicted by the double arrow inFIG. 5) so as to adjust the gap distance 113. The plate members 124 havethe same ratio of length 115 to gap distance 113 as discussed above, andmay have the same gap distances as discussed above.

Still referring to the embodiments of FIGS. 4 and 5, the top wall member110 cooperates with the vapor deposition head 62 to define thedeposition area 112 and provide additional sealing. For example, thevapor deposition head (e.g., the lower shell member 82) may engagedirectly against sealing surfaces 126 defined by the top wall 110. Thissealing arrangement ensures that the sublimated source material thatpasses through the distribution plate 88 is maintained in the opendeposition area 112 of the top member 110 and does not escape at theinterface of the conveyor assembly 100 and vapor deposition head 62.

Referring again to FIG. 2, the conveyor assembly 100 may include anymanner of additional functional components within the housing 104. Forexample, any number or configuration of heater elements 158 may beconfigured within the housing 104, or between the housing 104 and thecasing 95. Any configuration of thermal shields 160 may also becontained within the housing 104.

The present invention also encompasses various process embodiments forvapor deposition of a thin film layer on a photovoltaic (PV) modulesubstrate. The processes may be practiced with the various systemembodiments described above or by any other configuration of suitablesystem components. It should thus be appreciated that the processembodiments according to the invention are not limited to the systemconfiguration described herein.

In a particular embodiment, the process includes supplying sourcematerial to a deposition head and heating the source material so as tosublimate the source material. A plurality of the PV module substratesare conveyed in a continuous, non-stop manner below the deposition head.The sublimated source material moves downwardly within the depositionhead and deposits on the upper surface of the substrates in a depositionarea. The substrates are moved through entrance and exit slots atopposite longitudinal ends of the deposition area, with the entrance andexit slots defined by transversely extending entrance and exit sealsdisposed at a gap distance above the upper surface of the substrates andhaving a ratio of longitudinal length (in direction of conveyance of thesubstrates) to gap distance of from about 10:1 to about 100:1.

In a particular embodiment of the process, the source material is heatedwithin the deposition head with a heat source member and the sublimatedsource material passes through the heat source member before depositingonto the upper surface of the substrates. The substrates may be conveyedat a controlled constant linear speed such that leading and trailingsections of each substrate in a conveyance direction are exposed to thesame vapor deposition conditions within the deposition head to achieve asubstantially uniform thickness of the thin film layer on the uppersurface of the substrates.

This written description uses examples to disclose the invention,including the best mode, and also to enable any person skilled in theart to practice the invention, including making and using any devices orsystems and performing any incorporated methods. The patentable scope ofthe invention is defined by the claims, and may include other examplesthat occur to those skilled in the art. Such other examples are intendedto be within the scope of the claims if they include structural elementsthat do not differ from the literal language of the claims, or if theyinclude equivalent structural elements with insubstantial differencesfrom the literal languages of the claims.

1. An apparatus for vapor deposition of a sublimated source material asa thin film on discrete photovoltaic (PV) module substrates conveyed ina continuous non-stop manner through said apparatus, comprising: adeposition head configured for receipt and sublimation of a sourcematerial; said deposition head further comprising a distribution plateat a defined distance above a horizontal conveyance plane of an uppersurface of substrates conveyed through a deposition area of saidapparatus, the sublimated source material moving through saiddistribution plate and depositing onto the upper surface of thesubstrates conveyed through said deposition area; and, transverselyextending entrance and exit seals, said seals defining an entry slot andan exit slot for the substrates conveyed through said apparatus, atleast one of said seals disposed at a gap distance above the uppersurface of the substrates that is less than the distance between theupper surface of the substrates and said distribution plate and having aratio of longitudinal length to gap distance of from about 10:1 to about100:1.
 2. The apparatus as in claim 1, wherein said gap distance isbetween about 1/16 of an inch to about 3/16 of an inch.
 3. The apparatusas in claim 1, wherein each of said entrance and exit seals have theratio of longitudinal length to gap distance of from about 10:1 to about100:1 and comprise a flat, continuous surface over said longitudinallength thereof.
 4. The apparatus as in claim 3, wherein said entranceand exit seals are defined by heated structure of said deposition headat opposite longitudinal ends of said deposition area, said structureheated to a temperature greater than that of the substrates conveyedthrough said deposition area.
 5. The apparatus as in claim 4, whereinsaid deposition head further comprises a receptacle configured forreceipt of the source material and a heated distribution manifolddisposed below said receptacle, said heated distribution manifoldconfigured to heat said receptacle to a degree sufficient to sublimatesource material within said receptacle, said entrance and exit sealsdefined by transversely extends members of said distribution manifold.6. The apparatus as in claim 5, wherein said distribution manifolddefines a plurality of passages to allow passage of sublimated sourcematerial therethrough, and internal heating elements arranged betweensaid passages in said distribution manifold.
 7. The apparatus as inclaim 6, further comprising a movable shutter plate disposed above saiddistribution manifold, said shutter plate comprising a plurality ofpassages therethrough that align with said passages in said distributionmanifold in a first position of said shutter plate to allow passage ofsublimated source material through said distribution manifold, saidshutter plate movable to a second position wherein said shutter plateblocks said passages in said distribution manifold to flow of sublimatedmaterial therethrough.
 8. The apparatus as in claim 7, wherein saiddistribution manifold comprises an upper shell member and a lower shellmember, said shell members defining internal cavities in which saidheating elements are disposed, said entrance and exit seals defined bymembers of said lower shell member.
 9. The apparatus as in claim 1,further comprising a conveyor assembly configured below said vapordeposition head, said conveyor assembly further comprising: a housingdefining an enclosed interior volume; a conveyor operably disposedwithin said housing to be driven in an endless loop path within saidhousing, said endless loop path having an upper leg that moves in aconveyance direction, and a lower leg that moves in an opposite returndirection; said housing further comprising a top member defining saiddeposition area, said deposition head configured on said top member suchthat substrates on said conveyor are exposed to said distribution platethrough said deposition area in said top member; said top memberdefining said entrance and exit slots and associated said seals.
 10. Theapparatus as in claim 9, wherein said entrance and exit seals aredefined by plate members attached to said top member, said plate membersdefining said ratio of longitudinal length to gap distance.
 11. Theapparatus as in claim 10, wherein said plate members are adjustablerelative to said top member to adjust said gap distance.
 12. Theapparatus as in claim 9, wherein said conveyor comprises a plurality ofinterconnected slats, each of said slats having a respective flat planarouter surface and transverse edge profiles such that said outer surfacesof said slats lie in a common horizontal plane and define anuninterrupted flat support surface for the substrates conveyed throughsaid apparatus.
 13. The apparatus as in claim 1, further comprising aconveyor disposed below said deposition head, said conveyor comprising aplurality of interconnected slats, each of said slats having arespective flat planar outer surface and transverse edge profiles suchthat said outer surfaces of said slats lie in a common horizontal planeand define an uninterrupted flat support surface for the substratesconveyed through said apparatus.
 14. A process for vapor deposition of asublimated source material to form thin film on photovoltaic (PV) modulesubstrates, the process comprising: supplying source material to adeposition head; heating the source material so as to sublimate thesource material; conveying a plurality of the PV module substrates in acontinuous non-stop manner below the deposition head; directing thesublimated source material downwardly within the deposition head so thatthe sublimated source material deposits on an upper surface of thesubstrates in a deposition area; and moving the substrates throughentrance and exit slots at opposite longitudinal ends of the depositionarea, the entrance and exit slots defined by transversely extendingentrance and exit seals disposed at a gap distance above the uppersurface of the substrates and having a ratio of longitudinal length togap distance of from about 10:1 to about 100:1.
 15. The process as inclaim 14, comprising heating the source material within the depositionhead with a heat source, the sublimated source material passing throughthe heat source before depositing onto the upper surface of thesubstrates.
 16. The process as in claim 14, comprising conveying thesubstrates at a controlled constant linear speed such that leading andtrailing sections of the substrate in a conveyance direction are exposedto the same vapor deposition conditions within the deposition head toachieve a substantially uniform thickness of the thin film layer on theupper surface of the substrates.